Specification |
Application Fields: Chemical, Electronic, Food, Medical, New Energy, Petroleum, Pharmaceutical, Industrial, Medical, Laser Welding etc;
Condition: New, New;
Noise Level: Low, Ultra Low;
Parts: Air Compressor, Pre-Cooling Unit, Purifier, Air Compress, Pre-Cooling and So on;
Purpose: Gas Manufacturing, Gas Manufacturing;
Structure: Production Line;
Types: Air separation equipment;
Working principle: Cryogenic Separation Technology;
Usage: Nitrogen, Oxygen;
Machine Size: Customized;
Warranty: 1year;
Key Selling Points: Automatic;
Marketing Type: Cryogenic Liquid Air Separation;
Machinery Test Report: Cryogenic Liquid Air Separation Can Provided;
Warranty of Core Components: 1year;
Technology: Cryogenic Liquid Air Separation;
Purity: 93-99.9997%;
Capacity: 50-3000n3/H;
Applicable Industries: Industrial, Medical, Combustion Supporting;
Voltage: 220V/380V/415V/ Customized;
Pressure: (Adjustable);
Function: Cryogenic Liquid Air Separation;
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Application Fields: Chemical, Medical;
Condition: New;
Noise Level: Low;
Parts: Gas Tank;
Purpose: Gas Manufacturing;
Structure: Vertical;
Types: Air separation equipment;
Working principle: Electrolysis;
Model: 20-200A;
Current (a): 20A, 50A, 150A, 200A;
Fluorine Production Capacity (G/Hr): 12-120;
Fluorine Purity: 90-99%;
Suitable Applicaonstions 1: Chemical Vapor Deposition;
Suitable Applications 2: Semiconductor Industry;
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Application Fields: Chemical, Medical;
Condition: New;
Noise Level: Low;
Parts: Gas Tank;
Purpose: Gas Manufacturing;
Structure: Vertical;
Types: Air separation equipment;
Working principle: Electrolysis;
Model: 20-200A;
Current (a): 20A, 50A, 150A, 200A;
Fluorine Production Capacity (G/Hr): 12-120;
Fluorine Purity: 90-99%;
Suitable Applicaonstions 1: Chemical Vapor Deposition;
Suitable Applications 2: Semiconductor Industry;
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Application Fields: Chemical, Medical;
Condition: New;
Noise Level: Low;
Parts: Gas Tank;
Purpose: Gas Manufacturing;
Structure: Vertical;
Types: Air separation equipment;
Working principle: Electrolysis;
Model: 20-200A;
Current (a): 20A, 50A, 150A, 200A;
Fluorine Production Capacity (G/Hr): 12-120;
Fluorine Purity: 90-99%;
Suitable Applicaonstions 1: Chemical Vapor Deposition;
Suitable Applications 2: Semiconductor Industry;
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Application Fields: Food;
Condition: New;
Noise Level: Low;
Parts: Adsorption Tower;
Purpose: Gas Separation;
N2 Purity: 95%~99.9995%;
N2 Capacity: 0.5~30nm3/H;
Nitrogen Pressure: 0.1~1.0MPa;
Dew Point: -40c;
Usage: Nitrogen;
Machine Size: Small;
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